Funct. Mater. 2021; 28 1: 196-201.
doi:https://doi.org/10.15407/fm28.01.196
Characterization of Si/Mg2Si multilayer mirrors manufactured by sputtering of Mg and Si targets
National Technical University Kharkiv Polytechnic Institute, 2 Kyrpychov Str., 61002 Kharkiv, Ukraine
Abstract:
The principal possibility of manufacturing Si/Mg2Si multilayers by alternately deposited Si and Mg layers is demonstrated. The study of such Si/Mg2Si multilayer structure in the initial state and after thermal annealing in a temperature range of 100-300°C was made by X-ray diffraction methods. It was shown that a low level of the interface roughness (~ 0.8 nm) can be achieved in the Si/Mg2Si multilayer manufactured by the proposed method. Such Si/Mg2Si multilayers are stable up to 300°C.
Keywords:
magnetron sputtering, multilayer X-Ray mirror, magnesium silicide, X-ray diffraction, thermal stability.
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