Funct. Mater. 2023; 30 (3): 424-430.
Polishing of polystyrene scintillators
1Bakul Institute for Superhard Materials, National Academy of Sciences of Ukraine, 04074 Kyiv, Ukraine
2Institute for Scintillation Materials, National Academy of Sciences of Ukraine, 61072 Kharkiv, Ukraine
As a result of research in regularities of influence of material’s physical properties and the dispersion system on the polishing performance and roughness of polished surfaces of polystyrene-based plastic scintillators, it was found that the formation of slurry particles of the treated material is a consequence of the Forster resonant energy transfer that occurs in an open resonator formed by two parallel surfaces of the treated material and lapping pad, between the energy levels of polishing powder particles and treated material in the four-mode regime. It is shown that the material removal rate is determined by the total coefficient of volumetric wear, the total lifetime of treated surface clusters in an excited state and the resulting resonator quality factor at all possible frequencies. Roughness of polished surface depends on the spectral resolution and the resonator quality factor and is characterised by a superposition of the parameters Ra, Rq and Rmax, which are specific to each mode. It is shown that polishing of polystyrene-based plastic scintillators using a dispersion system of micro- and nanoparticles allows to reach the values of material removal rate and the roughness of polished surfaces, which satisfy the requirements for the polishing process of optical surfaces.
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