Funct. Mater. 2026; 33 (2): 238-245.

doi:https://doi.org/10.15407/fm33.02.238

A study of structural and optical properties of Al-doped ZnO thin films with varying doping concentrations

Achaichia Sarra, Hafdallah Abdelkader

Laboratory of applied and theoretical physics (LPAT), University Larbi Tebessi - Tebessa, 12002 Tebessa, Algeria

Abstract: 

Aluminum-doped zinc oxide thin films (ZnO:Al) with different percentages (between 0 and 7 atomic percent (at.%)) were deposited on glass substrates at 350°C using the spray pyrolysis technique. The effect of aluminum content on the structural and optical properties of ZnO:Al thin films was investigated. Firstly, X-ray diffraction study showed that the undoped and Al-doped ZnO:Al thin films crystallize in a hexagonal wurtzite structure, with the crystallites preferentially oriented along the (002) direction. Secondly, optical analysis in transmission mode showed that the average transmittance of the ZnO:Al thin films in the visible range is 75%. Moreover, the band gap energy Eg decreased from 3.285 to 3.156 eV as the Al content increased.

Keywords: 
ZnO:Al thin films, Spray pyrolysis, Optical properties, Semiconductor doping

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